YES-1224P (with plasma)
Vapor Deposition Systems
Silane vapor deposition is a process that assists in the deposition of a thin film of various materials in order to achieve precise surface modification.In recent years, silane vapor deposition has become the preferred method for coating surfaces with silanes.Our tools control the process, so results are precisely reproducible, substrate to substrate and run to run.
Whether you need a slick (hydrophobic) surface coating for microelectromechanical systems (MEMS) or a sticky (hydrophilic) surface for semiconductor or microarray processing, silane vapor deposition is especially suited for achieving uniform results.
Dehydration followed by vapor deposition coating provides a superior silane/substrate bond that is stable after exposure to atmospheric moisture, extending the time available between process steps. Chemical usage for a vapor deposition process is typically less than 1% of the amount needed for wet application processes, significantly reducing waste and chemical costs.
For more about the vapor deposition process, visit our vapor deposition application webpage.