YES-1224P (with plasma)
Vapor Deposition Systems
Precise Surface Modification and Coating for Products with Nanoscale Dimensions
Products in the medical industry require a diversity of surfaces from molecular specific bonding sites for DNA microarrays to biocompatible (hydrophobic) surfaces for medical devices. Products as diverse Microelectromechanical Systems (MEMS) also require hydrophobic surfaces to minimize stiction. As technology advances, the need for precise and reproducible control over nanoscale surface areas increases. While RF plasma can modify surface energies, the coating of functionally diverse organosilanes provides the ability for precise surface modification.
Silane vapor deposition is a process that assists in the deposition of a thin film of various materials in order to achieve precise surface modification. While wet chemical modification can be done, silane vapor deposition has become the preferred method for coating surface as the process environment can be tightly controlled. Our tools control the process environment, so results are precisely reproducible, substrate to substrate and run to run. Reproducibility is crucial in the manufacture of products for the medical industry.
The flexibility to use a large number of different organosilanes is enhanced by the capability to heat the chemicals as needed and to heat the substrates in a controlled process environment. This flexibility provides the ability for precise surface modification. First, total dehydration is achieved using vacuum/hot nitrogen cycle purges. Then, vapor deposition, in a controlled process environment, provides a superior silane/substrate bond that is stable after exposure to atmospheric moisture, extending the time available between process steps.
Whether you need a hydrophobic surface coating for Microelectromechanical Systems (MEMS) or biocompatible medical devices or a molecular specific bonding site for DNA microarrays, silane vapor deposition is especially suited for achieving consistent results. Chemical usage for a vapor deposition process is typically less than 1% of the amount needed for wet application processes, significantly reducing waste and chemical costs.
- Total control over process environment
- Flexible system accommodates a large variety of silanes, processes and surfaces
- Contact angle repeatability within +/- 3 degrees
For more about the vapor deposition process, visit our vapor deposition application webpage.