PRODUCTS
CLEAN
Clean
RESIST STRIP
In wafer fabrication, photoresist is used to transfer a circuit pattern onto the wafer.
RESIST DESCUM
Removing residues (scum) from a substrate through gentle plasma cleaning is known as descumming.
ORGANICS REMOVAL
Oxygen plasma etching is an effective treatment for “burning off”, or bombarding, organic residues left on wafer surfaces due to resist cross-linking or polymerization.
WIREBOND PREPARATION
After hybrid manufacturers stick the IC chip to the ceramic substrate, it’s baked to cure the epoxy.
PLASMA CLEANING
The use of plasma is an effective way to clean without using hazardous solvents. Plasma is an ionized gas capable of conducting electricity and absorbing energy from an electrical supply.
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