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Vapor Deposition Systems

Whether you need a moisture resistant barrier or a reactive surface for your application, the YES-LabKote is especially suited for achieving uniform results. This compact, tabletop unit is ideal for Research & Development laboratories and pilot line production.

There is a growing need for precise control over nanoscale surface areas. The YES-LabKote is designed to accommodate a variety of functionally diverse silanes for a variety of processes on a multitude of surfaces.

Typical applications:

MEMS packaging
Semiconductor fabrication
Microarrays
DNA microarrays
Protein microarrays
BioMEMS
Achieving biocompatibility

Silane Vapor Deposition Process

Dehydration followed by silane vapor deposition coating provides a superior silane/substrate bond that is stable after exposure to atmospheric moisture, extending the time available between process steps. The silane vapor deposition process begins with vacuum chamber cycle purges to prepare the substrates. The chamber is evacuated to low pressure and refilled with pure nitrogen several times to completely remove water vapor and oxygen. Nitrogen is preheated which helps heat slides and chips. Once cycle purges are finished the YES-LabKote system pumps the chemical directly from the source bottle to the heated vaporization chamber – without exposing the chemical to moisture or oxygen.

The Benefits of YES-LabKote & Vapor Deposition:

Efficient chemical usage
Repeatability – Substrate to substrate, run to run
Superior uniform coatings
Minimal waste
Vacuum dehydration
Process flexibility
Cost savings/Fast ROI
Reliability
Batch process

Summary

Successful surface modification requires stringent control of the interaction between the silane and substrates they contact. Using the YES-LabKote system you will achieve your specific results – with less chemical usage.

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