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Pre-owned

Yield Engineering Systems is now offering pre-owned and factory reconditioned YES tools!

Call 925-373-8353 or inquire within

Three (3) tools are currently for sale:

YES-CV200RFS (Plasma Photoresist/Descum System) Demo tool {$49,500 - Domestic}
YES-1224 (Vapor Deposition System) Demo tool {$125,000 - Domestic}
YES-G1000 (Plasma Cleaning System) Demo tool {$39,500 - Domestic}
YES-3 (Vacuum Bake/ Vapor Prime System) {SOLD}

YES-CV200RFS (Plasma Photoresist/Descum System):

Tool Control: PLC control of valves, temperature set points, plasma generation power, auto operation, touch screen interface, self-diagnostic program for easy troubleshooting
Ethernet for PLC monitoring and software downloads
12 Process Recipes with load/save/loop/link capability
Constant real-time display of System Status
Audible and Visual Indicators (light tower) for process completion or process upsets
RF Plasma Power: 40 kHz, 100 – 1000 W capacitive, downstream
0.1-1000 Torr Convection-type Pressure Sensor
Aluminum Process Chamber
Wafer platen temperature range from ambient to 250°C
Wafer platen pulls out of chamber for easy product loading
Parallel plate electrode
Capacity: single wafer/pieces for 50mm - 200mm; Dual wafer/pieces for two 100mm (increased capacity for smaller wafers optional with special pin placement)
Capable of processing wafer pieces on the wafer platen
Vent gas inlet with turbulence control
4 Process Gas Inlets with needle valve flow rate control
Process Chamber cooled by forced air convection
System requires one pump assembly (sold separately)
Strip rates up to 7000-8000 A/min at <10% uniformity. Dependent upon process temperature and gasses
Class 10 clean room compatible

Measurements:

Interior chamber dimensions: 10" W x 11.25" D x 1.96" H
Overall system dimensions: 23.5" W x 43" D x 44.6" H

YES-1224 (Vapor Deposition System):

Chemical Delivery Assembly

Two (2) chemical capacity. Withdraw directly from source bottles (chemical supplier's bottle)
Ventilated cabinet with secondary containment
Source material is kept at ambient temperature
Source bottle cap and plumbing are N2 purged
Two (2) micro pumps to allow precise metering of fluids
Polyimide vacuum/vapor valve seals for increased process tempeartures, chemical resistance and less maintenance
Two (2) independent vaporization micro flasks with independent chemical inlets
Two (2) independent temperature controls for vapor deliviery line
All source plumbing is PFA

Oven Assembly

316L Electro-polished stainless steel chamber
Heated door with special design for heater coverage and insulation to improve uniformity and prevent condensation. Design will lower thermal transfer into the clean room
Four (4) process trays can be configured in multiple positions to allow for different size substrates
Four (4) independent temperature control zones for the process chamber to ensure uniformity
Two (2) chemical vapor delivery (or water vapor) inlets, 3 plasma gas inputs, one additional process gas input
Gas plumbing located on rear of chamber for ease of maintenance
Preheated Nitrogen rapidly brings product to operational temperature
System for accurate process pressure tracking through all vacuum ranges
Rear-mounted, heated vacuum valve for ease of maintenance (prevents condensation at the valve). Independent controller can be set at any temperature between 0-205°C
Vapor check
Double door seal (Aflas) with Nitrogen purge zone

Controller Assembly

Four (4) zone PID Chamber Temperature Control, 25-205°C with front panel readout
PLC Controller with Touchscreen Operator's Interface
Over-temp Protection Shut-Off
EMO Buttons, (Front and Rear)
Ethernet to monitor, upload & download programs
Positive pressurized electronics chassis with failure interlock and visual confirmation

Measurements:

Chamber Size: 16" W x 16" D x 18" H
Overall System Dimensions: 40" W x 38" D x36" H

YES-G1000 (Plasma Cleaning System):

3 Mass Flow Controllers (MFCs) for gas mixing
Clean Room Capability: Class 10
N₂ Flow Rate: 1.7 SCFM
Process Gas Flow Rate: 20-50 SCCM average
Chamber Material: 6061-T6 aluminum
Process Gas Inputs: 3 standard, 4^th optional
SEMI® S2 Compliance
Number of Recipes: 12 with load/save/loop/link capability
RF Plasma Power: 0-1000 watts @ 550 VAC, selectable power
Nitrogen Consumption: 0 SCFM idle, 1.7 SCF for average processes
Reactant Gas Consumption: 0 SCFM idle, 150 SCC for average processes
Power Requirements: 208-230V, 20 amps, 50/60 Hz, 1 phase
State Logic Controlled System programmable through touch screen interface
Analog MFC control and monitoring (requires MFC options)
Removable electrodes conform to user requirements
Thermocouple monitoring for etch uniformity and protection of temperature sensitive substrates
Safety factors – integral RF and pressure interlocks
Emergency off switch
Ethernet Communications for Programming (data acquisition optional)
TCP/IP Port
Self-diagnostic program for easy troubleshooting.
Constant real-time display of System Status
Audible and Visual Cycle Complete Indicators.
Audible and Visual Indication of Incorrect Process with diagnostics display
0-1000 Torr Vacuum Sensor with 2 Programmable Trip Points.
Large load Capacity of up to 4 Active Plasma Areas of 15.13" W x 15.39" D inches (total of 931 sq. inches).
Operational Modes: RIE, Active, Downstream Electron-free, Active Ion Trap, and Grounded Ion Trap
Downstream mode produces charge-free plasma with near zero induced voltage
KF 40 Vacuum Plumbing
System Weight: 350 lbs. (159 kg.)
Microprocessor Controlled Mass Flow Controllers - Set of three MFC's (one for each input gas) controlled from system keypad.

Measurements:

Interior Chamber Dimensions: 18" W x 18" D x 12" H
Chamber Process Area: 931 in² or 233 in² per shelf
Overall System Dimensions: 23.5" W x 28" D x 44.6" H

YES-3TA (Vacuum Bake/Vapor Prime)

Microprocessor Control of output with input monitoring
120V AC instrumentation
Programmable cycle complete light
Programmable audible alarm
316 stainless steel chamber
Internal chamber welds
Two independent over-temperature safety switches
Preheated N₂ (Process Gas)
0.5 Micron N₂ (Process Gas) filter
Keylock to prevent unauthorized program entry
Removable stainless steel shelf
Side mounted HMDS flask