image reversal

This process reverses the action of positive resist so negative images can be formed with the same resolution and processing ease that a positive resist allows. What’s more, image reversal allows variations of the slope of the photoresist sidewall for higher resolution and/or lift off profiles.

For example, if the normal slope of approximately 68 degrees is altered to 90 degrees vertical, resolution is increased 20%. And, if an angle of 112 degrees is achieved, there is a strong overhang that makes metal deposition followed by liftoff controllable.

image reversal process

Image reversal advantages:

  • Allows variations of the slope of the photoresist sidewall for higher resolution and improved lift off.
  • Replaces use of harsh chemicals or plasma "metal etch” processes.
  • Using image reversal on two or more layer resist levels can eliminate residual photoresist along the sidewalls, preventing "shorts" from level to level without reducing line width.
  • Image reversal done with dark or light fields eliminates standing waves; this allows steep and straight profiles, repeatable results, and excellent chemical deposition uniformity.
  • Image reversal achieves excellent results for rework problems; underlying substrate is protected (for a double metal process), so unwanted metal can be stripped away without pitting or eroding the underlying level.

Why not just use a negative resist?

Positive resist offers far better resolution, and it doesn’t require solvents for development. In contrast, the resolution limit of negative resist is approximately 1 micron, and it requires solvents known to be carcinogens.

YES image reversal systems deliver anhydrous ammonia (NH3) into a vacuum oven. There are two advantages of an ammonia system: 1) easier control of vapor pressure, and 2) an absence of residual water vapor, which will react with the NH3 to produce NH3OH, a corrosive to the system that also creates contaminating particles.

For more information on achieving repeatable and usable reversals, visit the YES-58TA & 310TA product pages.

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News & Updates

  • August 9, 2016 - YES Featured in Two Trade Magazines
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  • April 26, 2016 - YES Exhibiting at Two Upcoming Tradeshows
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  • January 22, 2016 - YES Receives Multi-Million Dollar Orders for a Dynamic Project in Taiwan
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  • October 7, 2015 - YES CEO Speaking at the AVS 62nd International Symposium & Exhibition
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Located in Livermore, California, Yield Engineering Systems (YES) is a privately held company that manufactures engineering process control equipment to meet the needs of innovative engineers and lab managers.

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