Consists of modifying surfaces to encourage bonding between unlike materials. The surface modification may be accomplished via plasma bombardment, chemical reaction or a combination of the two.
YES-VertaCoat – Automated 200/300mm high temperature for today’s most demanding MEMS and semiconductor process applications. The tool’s silane vapor deposition process is the preferred method for coating surfaces.
YES-1224P & YES-LabKote – Designed to accommodate a variety of functionally diverse silanes, for a variety of surfaces. The silane vapor deposition is a process that assists in the deposition of thin film of various materials in order to achieve precise surface modification. In the YES-1224P the plasma function allows surface preparation, as well as, in-situ chamber cleaning to assure run-to-run repeatability.
YES-TA Series – This vacuum bake/vapor prime oven dramatically improves the application of HMDS as a surface priming treatment, which is used to enhance adhesion of photoresist on a wafer surface.
YES-G Series– The YES-G500 and YES-G1000 plasma cleaning systems give uniform plasma over surfaces and offers optimum plasma mode flexibility.